射频溅射Y-ZrO_2薄膜的研究

STUDY OF Y-ZrO_2 THIN FILMS DEPOSITED IN RF SPUTTERING SYSTEM

采用射频磁控溅射法制成含钇的二氧化锆薄膜,借助背散射分析(RBS)、透射电子显微镜(TEM)和X光衍射(XRD)方法研究了薄膜的化学剂量比、微观结构和相结构。同时研究了微观结构与机械性能(显微硬度、韧性、抗磨损性)之间的关系,以及退火对相稳定性的影响。

Y-ZrO_2 thin films were deposited using RF magnetron sputtering method. The film composition and structure which included stoichometry, microstructure and phase structure were investigated by means of RBS, TEM and XRD. The mechanical properties of the film were characterized by measuring the microhardness, toughness and wear resistance. The studies show that the microstructure of the film are affected by the oxygen percentage in the sputtering gas and by the substrate temperature. The phase structure of them are comtrolled by the sputtering parameters. The effect of annealing in the air on the phase stability of the films has been studied as well.