摘要
本文概述物理气相沉积的基本原理,具体介绍了离子溅射及离子表面沉积的几种主要工艺方法及其在工业上的应用等。
This paper briefly reviews the basic principles of physical vapour deposition, and detailed introduces some major technologies of ion sputting and surface deposition of ion plating and it's application in industry.
