摘要
文章从技术和市场两方面概括了近年来世界半导体硅工业的新动向。评述了单晶中的氧行为,CLF-CZ、FCCZ、MCZ等方法的应用,分析了硅工业的发展方向与国际市场的变化。
The new trends of semiconductor silicon industry abroad in recent years, are summarised from the point of technique as well as market. The oxygen behavior in the monocrystals, and the methods of CLF-CZ, FCCZ, MCZ, etc. are reviewed. The article gives the analysis as to the development trend of silicon industry and the changes in international markets.
关键词
半导体材料
硅
电子工业
Semiconductor, Silicon, Crystal growth, CZ silicon
