化学沉积法制硅化镍电极及其在线性电势扫描法中的应用

The Manufacture of NiSi Electrode by the Electroless Deposition and Its Application in Linear Sweep Voltammetry

利用化学沉积法在清洁的n型半导体材料硅上沉积金属镍,然后在450℃下热处理半小时,制成电极。经SEM和XPS对所制电极表面表证结果证明,热处理后金属镍与硅形成金属硅化物——硅化镍(NiSi)。将此电极应用于线性电势扫描实验中,实验证明,此电极性能稳定,可代替铂电极使用,是一种价格低廉、值得推广的新型电极。

In this paper,the electrode was first fabricated by the electroless doposition of Ni on the surface of chemically cleaned n—type Si,then was heat treated at the temperature of 450 C for half an hour. The characteristics of the surface of the electrode were investigated by SEM and XPS which indicate the formation of NiSi. It was applied in linear sweep voltammetry. Experiment indicated that the characterization of NiSi in place of Pt electrode is stable. It is a new type of electrode which is cheap and worth developing.