摘要
从多方面综述了微电子生产中环境洁净技术的最新发展动态，包括洁净室的柔性布置、微环境的概念、关于ＳＭＩＦ系统、静电及湿度的控制和风速的选择等。
The current development trend of environment cleaning technology in microelectronic production is 5ummarized in many ways, includirig the flex ble layout of clean rooms,the concept of mini-environment.SMIF svstem,elec-trostatic and humidity control,the selection of air-velocity and so on.
出处
《半导体情报》
1994年第6期40-45,共6页
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