摘要
介绍了用LCVD法合成并沉积TiC、TiN类陶瓷膜的方法、原理、工艺特点以及LCVD法的一些独特优点。
In this paper, introduced importantly laser chemical vapor deposition(LCVD) which is used to synthesis and deposit TiC(or TiN) ceramic film,and too gave the theories,technological characters and many special advantages of LCVD.
出处
《材料导报》
EI
CAS
CSCD
1994年第1期37-39,58,共4页
Materials Reports
