摘要
在电子束曝光机中，工件传动台、电磁偏转场及标记三者相对应的座标轴是否重合，是影响图形拼接精度的重要因素之一。本文概要地介绍了调校三座标系相互重合的方法，并给出了ＤＹ－５型亚微米电子束曝光机调校结果。
In electron beam exposure machines the coincidence of three correspon-ding coordinate systems of stage movement, electro-magnetic deflection andmark is one of the important factors which affect pattern stitching accu-racy. The paper introduced adjustment and correction methods of coincidingthe poly-coordinate systems, and gave adjustment and correction results ofDY-5 micro-EBEM.
出处
《电工电能新技术》
CSCD
北大核心
1994年第4期31-36,共6页
Advanced Technology of Electrical Engineering and Energy
关键词
电子束曝光机
微电子束
座标轴
electron beam exposure machine, micro-electron beam
