摘要
本文介绍了真空微电子器件中的场发射阴极硅锥尖的制作工艺,采用不同的腐蚀方法以及氧化削尖技术,制成了形状较好的硅尖,并对实验研究结果进行了比较、分析和讨论。
The fabrication technology of field emission si-tip cathodes for vacuum microeletronic devices is described in this paper.Well shaped si-tip array cathods were,obtained by using different etching methods and oxidation sharpening techniques and the photomicrographs are given,The detailed analysis and dixcussion are made on the process techinology.
出处
《电子器件》
CAS
1994年第3期94-98,共5页
Chinese Journal of Electron Devices