摘要
用试验方法测定了不同衬底材料上各种薄膜的表面离化函数Φ(0),并与Φ(0)的计算值加以比较。在计算中引入了一个有效的电子背散射系数,代表了衬底,薄膜原子序数不同时对Φ(0)的综合效应。在此基础上,详细讨论了Φ(0)值与衬底、薄膜二者的电子背散射系数,以及薄膜质量厚度的关系。
Date of surface ionization function Φ(0)for film on the various substrates have been measured by EPMA.And the comparison of data with the calculated values were coefficient was used to calculate the Φ(0),whichdiscribes the synthetic effect of the different ordinal number of atoms for surbstrates and film on Φ(0).Afterthat the relationship between Φ(0)and the electron backscattering coefficient of film and substrate and the massthickness of film was discussed.
出处
《电子显微学报》
CAS
CSCD
1994年第4期287-290,共4页
Journal of Chinese Electron Microscopy Society
关键词
表面离化函数
电子背散射系数
薄膜
surface ionization function electron backscattering coefficient mass thickness