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电珩磨-高速镀硬铬工艺临界电流密度的研究

An Investigation in the Critical Current Density in the Process of Electrohoning-Quick Hard Chromium Plating
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摘要 对电珩磨-高速镀硬铬工艺的临界电流密度进行了试验研究。得出的结论是:欲满足镀层表面硬度HV900以上、镀层表粗糙度?以下的要求,电流密度i下限取50A/dm^2,上限取120A/dm^2。当取i为50A/dm^2时,沉积速度为0.057mm/h,表面硬度为HV900,表面粗糙度为?;当取i为120A/dm^2时,沉积速度为0.18mm/h,表面硬度为HV1100,表面粗糙度为?。采用这项新工艺,可提高生产效率,降低低能量消耗,并使工件获良好的机械性能。 An experimental investigation in the critical current den-sity in the process of electrohoning--quick hard chromiumplating demonstrates the following conclusions: For obta?-ning the required surface hardness (higher than HV900) andsurface rating (below 0.63/?), the current density i should becontrolled in the range of 50--120A/dm^2. The deposit speed,surface hardness and surface rating art 0.057mm/h, HV900and 0.16/? respectively by i=50A/dm^2, and those by i=120A/dm^2are 0. 18mm/h, HV1100 and 1.12/? This new process leads tohigher productivity and lower energy consumption and provi-des good mechanical properties for the workpieces.
出处 《石油机械》 北大核心 1989年第10期17-21,5-6,共5页 China Petroleum Machinery
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