摘要
对高性能大面积光刻胶版的制备技术作了细致的论述，讨论了制备中容易产生的严重影响胶版质量的几个问题，提出了解决问题的方法。
The preparation method of photoresist plates with good quality and big area is descirbed in detail. The several factors which effect the quality of the plates are discussed and the solving methods are proposed.
出处
《光电工程》
CAS
CSCD
1994年第2期53-56,共4页
Opto-Electronic Engineering
关键词
光刻胶
涂胶
模压全息图
膜厚控制
半导体器件
Photoetching cements, Photoresist spinning, Embossing holograms,Film thickness control.
