新型全息记录软片DC─TAC的光化学刻蚀特性

The Photochemical Etching Property of a New Holographic Recording Material:Dichromated Cellulose Triacetate

报导一种新型全息记录材料（ＤＣ─ＴＡＣ）的光化学刻蚀特性，给出了刻蚀深度对曝光量以及对显影时间的依赖关系，还讨论了刻蚀过程中图形传递的失真度问题。指出了ＤＣ─ＴＡＣ作为微光学元件光刻材料的重要应用前景。

This paper reports photochemical etching property of dichromated cellulose triacetate (DC-TAC),a new holographic recording material;The curves of etched depth depending on exposure and development times are given. The distortion of profiles transfer in the processing is also discussed. The paper points out that there is a good prospect in using DC-TAC as photoetching material of micro-optical elements.