摘要
我国第一代同步辐射Ｘ射线分步曝光系统已经安装在北京同步辐射装置（ＢＳＲＦ）Ｘ光束线５的末端，并且于１９９２年通过国家验收。本文描述它的整体结构和性能水平，并且同国外同类装置进行比较。最后，提出存在问题、改进设想和未来的发展方向。
The first generation synchronous radiation X-ray exposure system has installed on the end of Beijing synchronous radiation facility beam line-5 in 1991.The completed project has been checked and accepted by the related departments of our country,in 1992. The whole construction and performances are described,and a comparison with the foreign similar devices has been carried out. In the end, the problems,and the improving ways, and the future orientations have been proposed.
出处
《光电工程》
CAS
CSCD
1994年第5期44-50,共7页
Opto-Electronic Engineering
关键词
X射线光刻机
同步辐射
X射线光刻
X-ray photoetching machines, Synchronous radiation, X-ray photoetching.
