摘要
建立了在二元光学元件优化设计中独立自变量数目与入出射图案之间的数学关系,指出了以往将元件所有单元位相作为自变量直接进行优化的不当所在,为减少设计中计算量与得到好的设计结果提供了一条有效途径;另外,成功地将一种比模拟退火算法计算量小的优化算法──ALOPEX应用到二元光学元件的设计中来,结合这两方面,提出了一种计算量小,且抗局部极值能力强的通用二元光学元件设计方案,最后比较了多种算法的设计结果.
In order to lighten the heavy calculation in the optimal design of binary optical elements, the relation-shap between the number of the independent variables in the optimization and the intensity distributions of the input and/ot output pictures is set up mathematically. A general optimization algorithm the ALOPEX is introduced to this area. By tubing these together, a general scheme for the optimal design of binary optical elements, which needs shorter computing time and has a strong ability of resiStance to thelocal extrema is proPOsed. Some deSign results by using defferent algorithms arecompared.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1994年第4期425-429,共5页
Acta Optica Sinica
关键词
二元光学
辐射聚焦器
逆衍射
binary optics, radiation focusator, inverse diffraction