摘要
建立了单光子光化烧孔的三能级模型,求解了反映质子转位变构机制的速率方程组,推导了成孔过程的动力学特性,获得了可与实验进行比较的解析解.用时域和频域两种方法测量了THP/PMMA和TMP/PMMA薄膜样品光谱烧孔的动力学过程,得到与理论分析一致的规律,并测得了有效成孔速率和成孔时间等参数.这些参数对于评价频域光存贮材料性能有一定意义.
An analytical model for single-photon spectral hole burning was presented. Rate equations were solved and the dynamical properties for the hole formation was derived. Experimental measurement were Performed for the hole-growing process by methods both in frequency domain and in time domain. The results were in agreement with the theoretical analysis. Effective hole-growing rate and the time of hole formation were obtained by a least square fit with the model.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1994年第9期924-930,共7页
Acta Optica Sinica
基金
国家863计划
国家自然科学基金
关键词
光谱烧孔
动力学
卟啉分子
persistent spectral hole burning, dynamics, free-base porphyrins.