摘要
本文介绍了一种新发展的ＭＣＰ制造技术和几种制造技术的新发展，如ＡＴ－ＭＣＰ、叠层ＭＣＰ、光敏玻璃基ＭＣＰ及微电铸ＭＣＰ等制造技术；与ＲＬＳＧ－ＭＣＰ制造技术相比，尽管它们目前仍未达到广泛应用的程度，但对促进ＭＣＰ未来的发展将有很大的潜力，尤其是ＡＴ－ＭＣＰ制造技术。
This paper presents a novel method and new developments of sometechnologies for manufacturing MCPs,such as the methods of manufacture for AT-MCPs,MCP s with altemating conductive and insulating hiyers,photosensitive glasssu bstrate MCPs,and micro-electroforming MCPs,As compared with the prevailingmethod of manufacture for RL SG-MCPs,they are not widely used in fabricating MCPsyet,but they have a great potential for future development of manufacturing MCPs,particulariy,the technology of manufacture for AT-MCPs.
出处
《光子学报》
EI
CAS
CSCD
1994年第2期158-167,共10页
Acta Photonica Sinica
关键词
微通道板
化学汽相沉积
制造
MCP
CVD,Dry etch
Thin-film
Photolithography
Photosensitive glass
Micro-electroforming
