Ar，Ti离子注入Si_3N_4表面改性的研究

SURFACE MODIFICATION OF Si_3N_4 CERAMICS IMPLANTED WITH Ar AND Ti IONS

研究了Ｓｉ＿３Ｎ＿４陶瓷及其表面蒸镀Ａｌ膜试样的离子注入效果。结果表明，Ｔｉ高子的注入与Ａｒ离子的注入都可提高Ａｌ膜与陶瓷基体的结合力，并在一定的注入剂量范围内随着注入剂量的增加，Ａｌ膜与陶瓷基体的结合力也有增加的趋势。Ｔｉ离子的注入使表面硬度增加，表面硬度随Ｔｉ离子注入量的增加而提高。Ａｒ离子的注入（１０￣（１５）Ｉｏｎｓ·ｃｍ￣（－２））也使表面硬度增加，但继续增加Ａｒ离子的注入量，表面硬度却下降。根据显微硬度压痕附近的裂纹长度，评价了Ｔｉ离子注入Ｓｉ＿３Ｎ＿４陶瓷表面的断裂韧性。离子注入可改善Ｓｉ＿３Ｎ＿４陶瓷的表面韧性，并且随着离子注入剂量的增加，韧性改善的幅度也变大。

The effect of ion implantation on ceramic Si_3N_4 with Al film coating was studied.Results showthat implantation of Ti ions or Ar ions increases the adhesion with the substrate. The adhesion between Al filmand the substrate increases with the increases of implantation within proper range. The surface hardness is alsoincreased with increasing implantation of Ti ions. Implantation of Ar ions around 10￣(15)Ions·cm￣(-2) enhanced thesurface hardness but more implantation decreases the hardness. Surface fracture toughness of Si_3N_4 ceramics im-planted with Ti ions is evaluated based on the crack length in the neighbourhood of indentation. Ion implantationimproves surfase toughness of Si_3N_4 ceramics. The effect is more obvious as the implanted ion increases.