摘要
本文介绍了第一壁TiC涂层材料的化学气相沉积(CVD)工艺;研究了涂层工艺条件对涂层微观结构、沉积速率和基体对涂层生长的影响;给出了涂层厚度与涂层工艺条件之间的经验关系式。讨论了TiC/石墨、TiC/MO、TiC/316LSS涂层材料的电子束热冲击损伤机理和热疲劳损伤机理,并对TiC/石墨、TiC/Mo、TiC/316LSS用做现行Tokamak第一壁材料的可行性进行了分析。
This paper describes chemical vapor deposition (CVD) process of depositing TiC coatedmaterials by the TiCl4-CH4-H2 system, the influence of coating conditions on coating microstructure, deposition rate and the influence of substrates (Mo, graphite and 316LSS) oncoating growth. The experimented relationship between coating thickness and process conditions is given. For TiC / graphite, TiC / Mo, TiC / 316LSS, the failure mechanism of highpower density electron beam thermal shock and thermal fatigue is discussed, the possibility ofusing them as the first wall of current operating Tokamak devices is analysed.
出处
《核动力工程》
EI
CAS
CSCD
北大核心
1994年第4期294-302,共9页
Nuclear Power Engineering
关键词
聚变堆
第一壁
涂层
碳化钛
Fusion reactor the first wall TiC coated materials Coating growthThermal shock The failure mechanism