用离子团簇束及反应离子团簇束技术沉积Zn及ZnO薄膜

Zn and ZnO Films Deposited by Ionized Cluster Beam and Reaction Ionized Cluster Beam Techniques

用文题所述技术，在玻璃基板上制出了Ｚｎ及ＺｎＯ薄膜。用ＳＥＭ、ＸＲＤ、ＡＥＳ及ＳＥＥＬＦＳ方法，分别研究了其表面形貌、组成、薄膜结构及表面精细结构，同时探讨了薄膜生长过程。结果表明：Ｚｎ薄膜为（００２）面上择优生长的多晶膜，其生长过程为岛状生长：ＺｎＯ薄膜为无定形迷津网络结构，薄膜表面主要含有Ｚｎ、Ｏ两种组分，无其它杂质，Ｚｎ─Ｏ键长为０．２０３ｍｍ。

Zinc and zinc oxide films on glass substrate were prepared by ionized cluSter beam deposition and reaction ionized cluster beam deposition. The surface morphologies,chemical compositions,film structures and Surface fine structures of the films were studied by SEM,XRD,AES and SEELFS. The film growing processes were also discussed. The resuls show that the Zn film is a polycrystalline film,which grows preferentially in the direction of(002) plane with a island-like growth;the ZnO film exhibits an amorphous mesh structure,which is composed of Zn and O on the surface,and the interatomic distance between zinc and oxygen is 0.203nm.