摘要
作者在临床上测试了100颗9~51岁人恒磨牙窝沟和牙尖的电阻值,发现牙尖的电阻值非常显著地高于窝沟的电阻值,在活体牙上印证了刘峰等提出的牙冠表面低电阻区与龋病好发部位有相关性的观点,为龋病发病机理的生物电化学理论提供了新的实验印证。
Abstract The 100 permanent molar teeth Obtained from 9 to 51 years old patients were measured on the resistance value of the cusp and the fissure in vivo.It was found that the resistance value of the cusp was significantly higher than that of the fissure,The result supports Liu's viewpoint of that lower resistance areas are liable to caries.The result also presents much more experimental proofs of Bio-electrochemical Theory of Pathogenesis of Dental Caries.
出处
《华西口腔医学杂志》
CAS
CSCD
北大核心
1994年第2期90-92,共3页
West China Journal of Stomatology