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脂润滑下二硫化钼溅射膜的摩擦特性 被引量:4

The Frictional Characteristic of Sputtered MoS2Films under Grease Lubrication
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摘要 MoS_2溅射膜通常是用于干摩擦的场合,因而对它在脂润滑下的摩擦学行为,特别是对其在边界润滑状态下的作用都还很少有人进行研究。以解决空心圆柱滚子轴承早期磨损失效为主要目的,利用球-盘摩擦磨损试验机考察了在脂润滑下MoS_2溅射膜的摩擦特性。结果表明,脂加MoS_2溅射膜可以在比较宽的速度和载荷范围内表现出良好的减摩性能,此外,还利用X射线光电子能谱方法测定了射频溅射MoS_2固体润滑膜的元素化学状态、成分深度分布和膜层厚度等,分析了成膜条件对MoS_2溅射膜的影响,为获得理想的MoS_2薄膜提供了科学依据。 in view of the sputtered MoS2 films are usually used in dry friction, the frictionalcharacteristic of the sputtered MoS2 films under grease lubrication, especially under boundarylubrication, has not been widely investigated. In order to improve the wear-resistance of hollowcylindrical roller bearing, the sputtering technology and the frictional characteristic of MoS2 filmsunderhigh-speed lithium grease lubrication were investigated with ball-dise tester. The resultsshown that sputtered MoS2 films possesses excellent frictional characteristic under the testingconditions. In addition, the chemical states and distribution of elements depth, the thickness ofsputtered MoS2 films were analyzed using X-ray photoelectron spectroscopy (XPS). The influenceof sputtered parameters to MoS2 films were also analysed , the experimental basis to obtain excellentMoS2 films was provided.
出处 《摩擦学学报》 EI CAS CSCD 北大核心 1994年第4期314-319,共6页 Tribology
关键词 脂润滑 MoS2溅射膜 摩擦特性 光电子能谱 grease lubrieation , sputtered MoS2 film , frictional characteristic X-ray photoelectronspectroscopy
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