摘要
为了从实验上深入研究超热电子产生规律，从而减少或抑制超热电子对惯性约束聚变（ＩＣＦ）的危害，我们制备了一系列薄壁腔靶，以供实验研究。本文详细地描述了柱形薄壁腔靶的制备工艺。利用ＮＧ－１０４型精密单向纵切车床，采用金刚石刀具车削，提高心轴质量，表表粗糙度可达０．１μｍ。采用电镀和磁控溅射二种方法镀膜，为了使腔靶壁厚均匀，在镀膜时，必须使心轴匀速旋转。利用磁控溅射在腔靶外表面再涂上１μｍ左右厚的二氧化硅，以提高超薄壁腔靶的强度和自立能力。在腐蚀心轴时，必须仔细控制酸的浓度，防止在腐蚀时因产生气泡太多，太快而使腔靶破裂。用Ｘ射线照相法和扫描电子显微镜测量腔靶的几何参数。制备系列柱形薄壁腔靶达到指标为：壁厚范围２～３０μｍ，壁厚均匀性小于１０％，表面粗糙度０．２～０．３μｍ。最后介绍了在“神光Ⅰ”上打靶结果。结果表明，实验值与理论值符合较好。
On the purpose of studying the superthermal electrons’behavior well,reducing their disaster on ICF, we have fabricate series of cylindrical thinwall cabity targets.The details of fabrication process is described.In order to obtain cavity target with adjustable and uniform wall thickness,lower surface roughness and ability for supporting itself, we must solve following problems:high quality mandrel,electroplating coating and magnetic sputtering coating,wall thickness scale,unifoimity of mandrel rotating,increasing intensity of suporthinwall cavity targets,cavity-rupture prevention during corroding mandrel and thinwall parameters measuring.At last,we give out the experimental results briefly.
出处
《强激光与粒子束》
EI
CAS
CSCD
1994年第4期573-580,共8页
High Power Laser and Particle Beams
基金
中物院科学基金
关键词
超热电子
薄壁腔靶
微靶工艺
惯性约束聚变
superthermal electron,thinwall cavity target,micro-technology for targets fabrication,scanning electron microscope,X-ray microphotograph.
