摘要
采用石英毛细管柱与氩检测器相联结的气相色谱方法定量检测高纯的光纤原料四氯化硅中微量三氯氢硅等含氢杂质。该方法简单、可靠,三氯氢硅的检测下限达0.1×10 ̄(-6)W/W。
GC method for detemining trace SiHCl_3 in high purity SiCl_4 has been developed. The methed,using afused sinica capillary column for separation and a sensitive argon detector for quantitative determination of someimpurities of ppm level,is simple, stable and reliable. the minimum detectable concentration was 0.1 ppm forSIHCl_3. This GC system is resisting to corrosion of the sample in the long run.
出处
《色谱》
CAS
CSCD
北大核心
1994年第2期108-109,113,共3页
Chinese Journal of Chromatography
关键词
色谱
三氯氢硅
四氯化硅
光学纤维
gas chromatography,SiHCl_3,SiCl_4,argon detector