不同衬底上离子束辅助沉积MoS＿x膜的研究

STUDY ON MoS_x FILMS DEPOSITED ONTO DIFFERENT SUBSTRATES BY ION BEAM ASSISTED TECHNIQUE

利用离子束辅助技术在黄铜与２０￣＃钢衬底上进行了沉积ＭｏＳ＿ｘ膜的研究，对该膜在常温大气环境中的摩擦磨损特性用针－盘磨损试验进行了评价；用ＸＲＤ和ＸＰＳ检验了磨损前后膜的生成相、组分及Ｍｏ元素价态的变化，发现不同衬底上的ＭｏＳ＿ｘ膜在磨损中出现显著不同的结晶学变化，并对这一现象作了讨论。

MoS_x films in 200nm thickness are deposited onto brass and No.20 steel by the ionbeam asekisted technique , respoctively. Their friction and wear properties are evaluated using a pin-on-disk arrangement in atmosphere at the room temperature ,phases ,composition of these films and changein chemical valence of the Mo element are examined by XRD and XPS before and after the weartestes , respectively. The authors have observed that a different obvious crystallography change ofMoS_x films on the different substrates is appeared. The phenomen is disscused in this paper.