a－Si：H薄膜的表面缺陷研究

STUDY OF SURFACE DEFECTS ON THE A-Si:H FILMS

ａ－Ｓｉ：Ｈ薄膜的缺陷会给以该材料制作的半导体器件，如太阳电池、激光唱盘、光导鼓、ＴＦＴ等造成疵点，降低器件的质量和成品率；而对微波功率器件，这些缺陷则是致命的危害。本文讨论表面上由细微颗粒造成的各种缺陷。揭示这些缺陷的微结构形貌，对其形成的原因进行理论分析，并就如何消除这些缺陷，制备光洁如镜的ａ－Ｓｉ：Ｈ薄膜进行讨论。

On the surface of a-Si:Hfilms prepared by the glow discharge method.there are some defects which form the flaw in some semiconductive devices such as solar cells.laser disc, photoconductive drums. TFT devices and so on.So that. the quality and the ratio of the end product of them become poorer and lower. Especially. these flaws are fatal for the microwave power devices.In this paper. the surface defects caused by some line-grained. its cause of formation and the way to eliminate them from the devices are discussed and some results are obtained.