微波等离子刻蚀CVD金刚石膜提高机械研磨效率

Microwave plasma etching CVD diamond films as ameans enhancing mechanical lapping efficiency

针对低温低压化学气相沉积(CVD)金刚石膜表面粗糙且厚薄不均,普通的方法抛光金刚石膜效率低的现象,采用空气等离子刻蚀金刚石膜与机械研磨相结合的抛光工艺,提高了金刚石膜的抛光加工效率.并与纯机械研磨法比较,通过观察样品的表面形貌,说明等离子刻蚀的作用.

CVD diamond films have rough surface and nonuniform thicknesses which can adversely limit their application, it is important to polish them. The experiment used microwave plasma(MP) etching diamond films in conjunction with mechanical lapping,and by comparing MP etching with mechanical lapping by used SEM, the effect of MP etching to diamond films has been explained.