摘要
CCD(电荷藕合器件)是一种在硅集成电路工艺线上制作的图像传感器.介绍了CCD的基本工作原理和制造的单项工艺,并详细介绍了其关键工艺氧化、光刻、离子注入,还对各工艺所遇到的问题、相应的解决方法及发展状况进行了阐述.
CCD (charge coupled device) is a sort of imaging sensor manufactured in silicon integrated circuit. The CCD operating schematic diagram and single fabrication process including oxidation, lithography, ion implantation were presented. The technology issues, the solution and the development were described.
出处
《光电技术应用》
2005年第1期38-42,共5页
Electro-Optic Technology Application
关键词
CCD
氧化
光刻
离子注入
CCD
oxidation
lithography
ion implantation.
