摘要
采用I-V亚阈测量技术,分析了封闭栅和条形栅结构CMOS/SOS器件的logI-V曲线亚阈斜率和阈电压的总剂量电离辐照特性,以及不同的辐照偏置条件对上述两个电参数的影响。结果表明,在总剂量辐照下,封闭棚和条形栅CMOS/SOS器件的阈电压及logI-V曲线亚阈斜率的变化趋势基本相同。
The thereshold voltage and subthreshold slope function of log (I)-V curve of edgeless gate and typical gate CMOS/SOS device were analysed with I-V subthreshold measuring technique after total dose radiation.The different hiss of gate was applied during radiation. The results indiCated that the shift of threshold voltage of edgeless CMOS/SOS is almost the same with that of typical CMOS/SOS for total dose radiation, so is the slope function of log (I)-V curve.
出处
《微电子学与计算机》
CSCD
北大核心
1994年第6期7-10,共4页
Microelectronics & Computer