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CMOS/SOS器件亚阈区的总剂量电离辐照特性

Total Dose Radiation Characteristics at Subthreshold Range of CMOS/SOS Device
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摘要 采用I-V亚阈测量技术,分析了封闭栅和条形栅结构CMOS/SOS器件的logI-V曲线亚阈斜率和阈电压的总剂量电离辐照特性,以及不同的辐照偏置条件对上述两个电参数的影响。结果表明,在总剂量辐照下,封闭棚和条形栅CMOS/SOS器件的阈电压及logI-V曲线亚阈斜率的变化趋势基本相同。 The thereshold voltage and subthreshold slope function of log (I)-V curve of edgeless gate and typical gate CMOS/SOS device were analysed with I-V subthreshold measuring technique after total dose radiation.The different hiss of gate was applied during radiation. The results indiCated that the shift of threshold voltage of edgeless CMOS/SOS is almost the same with that of typical CMOS/SOS for total dose radiation, so is the slope function of log (I)-V curve.
出处 《微电子学与计算机》 CSCD 北大核心 1994年第6期7-10,共4页 Microelectronics & Computer
关键词 CMOS器件 SOS器件 电离辐照 阈电压 Dose Threshold voltage Interface -state
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