摘要
现代光刻机集机械、材料、光学、控制、计算机等学科前沿技术为一体,具有高速高精度和结构复杂的特点,大大增加了实现光刻机高性能高可靠性的难度。论述了采用FMEA对光刻机可靠性的研究,总结了应用FMEA方法进行光刻机系统分析的步骤和流程,最后应用该方法对光刻机整机系统进行了可靠性分析和评估。
The modern lithography tool, integrating the top techniques of many fields such as mechanics, material, optics, control and computer science, is characterized with high speed, high accuracy and complexity, which make it more difficult to assure the reliabilities of lithography tool. By carefully researching the reliability of lithography tool, this paper introduces FMEA to this area and describes the whole analysis process of this application. At last, the analysis and evaluation of reliability are described for the lithography system.
出处
《电子工业专用设备》
2005年第2期59-62,共4页
Equipment for Electronic Products Manufacturing
关键词
FMEA
可靠性评估
失效形式
光刻机
FMEA
Reliability assessment
Failure mode
Lithography tool
