用于动态红外景物模拟器的超薄氮化钛薄膜

Thin TiN_X Films for the Application in Dynamic Infrared-ray Scene Generator

针对动态红外景物模拟器的应用要求,用磁过滤电弧离子镀方法制备了超薄氮化钛薄膜。制备的薄膜厚度介于7.5nm至75nm。重点研究了薄膜的微观结构、电阻温度系数、电阻温度稳定性、薄膜的微加工等性质。实验结果表明,氮化钛薄膜是一种良好的辐射电阻材料。

Thin titanium nitride (TiN_X) films were prepared by using filterd arc plasma method to meet the requirements of the application of the thin films in dynamic infrared-ray scene generator.Thickness of the prepared thin films was between 7.5nm and 75nm. Microstructures,temperature coefficient of resistance,temperature stability and the micromachining of the TiN_X thin films were investigated into details.lt has been shown that the thin TiN_X films are good candidate materials for dynamic infrared-ray scene generation application.