热灯丝辅助射频等离子体CVD法生长立方氮化硼膜的研究

STUDY ON CUBIC BORON NITRIDE FILMS DEPOSITED BY THERMAL FILAMENT ASSISTED RF PLASMA CVD

本文对热灯丝（热电子）辅助射频等离子体ＣＶＤ法制备的立方氮化硼（ｃ－ＢＮ）薄膜进行了研究。实验结果表明，ｃ－ＢＮ膜的质量与膜沉积条件有密切的关系。并对其结果作了简要讨论。

Cubic boron nitride(c-BN)films by thermal filament assisted RF CVDhave been studied. Experimental results have shown that the quality ofc-BN films closely depends on the deposition conditions of the films,Theresults have been discussed briefly.