光掩模激光修补技术

PHOTOMASK LASER REPAIR TECHNOLOGIES

本文论述了掩模缺陷成因、类型，掩模修补的重要性和掩模修补（包括相移掩模修补）的原理和方法。比较详细地介绍了中科院光电所研制的ＬＭＲ－１型掩模缺陷激光修补仪的主要性能指标，给出了实验结果。对于激光气化法修补时溅射物产生原因和改善修补质量的方法做了分析，并对用于透明缺陷激光修补的激光化学气相沉积方法和装置作了介绍。

The reticle defect formation and typies,mask,including Phase-shift mask,repair importance, principles and technologies are discussed,Model LMR-1mask laser repair system developed by Institute of Optics and Electronics of Chinese Academy of Science is described in detail,Experimental results are aiso given。 Causes of sputter preduct ion in laser vapourng repairing defects and methods for improving the quality of defect repair are analysed。The apparatus and process Jaser chemical vapour deposition(LCVD)for clear defect repair are introdued。