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Laser induced damage of multi-layer dielectric used in pulse compressor gratings 被引量:1

Laser induced damage of multi-layer dielectric used in pulse compressor gratings
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摘要 Laser induced damage threshold (LIDT) of multi-layer dielectric used in pulse compressor gratings (PCG) was investigated. The sample was prepared by e-beam evaporation (EBE). LIDT was detected following ISO standard 11254-1.2. It was found that LIDTs of normal and 51.2° incidence (transverse electric (TE) mode) were 14.14 and 9.31 J/cm2, respectively. A Nomarski microscope was employed to map the damage morphology, and it was found that the damage behavior was pit-concave-plat structure for normal incidence, while it was pit structure for 51.2° incidence with TE mode. The electric field distribution was calculated to illuminate the difference of LIDT between the two incident cases. Laser induced damage threshold (LIDT) of multi-layer dielectric used in pulse compressor gratings (PCG) was investigated. The sample was prepared by e-beam evaporation (EBE). LIDT was detected following ISO standard 11254-1.2. It was found that LIDTs of normal and 51.2° incidence (transverse electric (TE) mode) were 14.14 and 9.31 J/cm2, respectively. A Nomarski microscope was employed to map the damage morphology, and it was found that the damage behavior was pit-concave-plat structure for normal incidence, while it was pit structure for 51.2° incidence with TE mode. The electric field distribution was calculated to illuminate the difference of LIDT between the two incident cases.
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2005年第3期181-183,共3页 中国光学快报(英文版)
基金 This work was supported by the National Natural Science Foundation of China (No. 10376040)the National "863" Project of China (No. 863-804).
关键词 CALCULATIONS Dielectric materials Diffraction gratings Electric fields EVAPORATION Morphology Optical multilayers PITTING Calculations Dielectric materials Diffraction gratings Electric fields Evaporation Morphology Optical multilayers Pitting
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