摘要
采用磁控溅射技术制备了优良的NiCr系深蓝色太阳光谱选择性吸收薄膜,测试了样品的太阳吸收比和热发射比,α_s=0.90~0.94,ε=0.08~0.16(80℃)。用椭偏法测量了两层膜系的光学常数,借助扫描电镜、透射电镜、X射线衍射对薄膜进行了表征,并初步讨论了溅射工艺对样品结构形貌和光学性能的影响。
NiCr system solar selective coatings with a dark blue surface were prepared by reactive magnetron sputtering process, the solar absorbance αS=0.90-0.94 and the thermal remittance Ε=0.08-0.16 (80°C). The coatings were characterized by SEM, TEM and XRD. The relations between sputtering process and the optical properties, the microstructure and the surface morphology were discussed.
出处
《太阳能学报》
EI
CAS
CSCD
北大核心
2005年第1期52-58,共7页
Acta Energiae Solaris Sinica
基金
广东省"磁控溅射制备太阳能光谱选择性吸收涂层"项目(2002B30804及2001-Z-117-01)中科院百人计划
关键词
选择性吸收
NiCr系
溅射工艺
结构形貌
光学性能
Magnetron sputtering
Microstructure
Nickel alloys
Optical properties
Scanning electron microscopy
Substrates
Thin films
Transmission electron microscopy
X ray diffraction analysis