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化学氧化对多孔硅表面态和光致发光的影响 被引量:5

The Influence of Chemical Oxidation on Surface State and Photoluminescence of Porous Silicon
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摘要 The changes in photoluminescence and FTIR spectra of porous silicon subjected to oxidation were exdrined. With the increase of okidizing duxation, the relative amount of the Si-H2 surface species on PS decreases even though the photoluminescence intensity increases. the result suggests that it isn’t SiH2 but Si-O and Si-O-Si on theinterface of PS play a key role in enhancing the pllotoluminescence. A complete photoluminescence mechanism should consider the influence of su-rface state of porous silicon based on the quantum codriement effect model. The changes in photoluminescence and FTIR spectra of porous silicon subjected to oxidation were exdrined. With the increase of okidizing duxation, the relative amount of the Si-H2 surface species on PS decreases even though the photoluminescence intensity increases. the result suggests that it isn't SiH2 but Si-O and Si-O-Si on theinterface of PS play a key role in enhancing the pllotoluminescence. A complete photoluminescence mechanism should consider the influence of su-rface state of porous silicon based on the quantum codriement effect model.
出处 《物理化学学报》 SCIE CAS CSCD 北大核心 1994年第8期737-740,共4页 Acta Physico-Chimica Sinica
基金 国家自然科学基金
关键词 多孔硅 光致发光 化学氧化 表面态 Porous silicon, Fourier transformed infrared transmission spectra, Photoluminescence, Photoluminescence mechanism
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参考文献2

  • 1张树霖,Appl Phys Lett,1993年,62卷,1页
  • 2Tsai C,Appl Phys Lett,1992年,60卷,1700页

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