摘要
利用带折射修正的布喇格衍射定律和薄膜光学理论分析了低角X射线衍射谱中出现的一系列现象,导出了多层膜周期厚度和周期中不同材料间的配比率的计算公式,对多层膜的低角X射线衍射谱中主峰间的次峰现象作出了解释,并对低角X射线衍射测量单层膜厚度进行分析,给出了精确的测厚公式。
The period thickness,mean refraction corrected factor and the ratio betweentwo difference materials in a period can be deduced from the Bragg equationwith refraction correction.Based on this Bragg' s law and theory of optical thin film,the formula introduced in this paper have been verified in theory and experimentwith short-period Mo/Si multilayers.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1994年第6期958-965,共8页
Acta Physica Sinica