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Microstructure of ternary Zn_(1-x)Cd_xO films on silicon substrate

Microstructure of ternary Zn_(1-x)Cd_xO films on silicon substrate
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摘要 Ternary Zn1-xCdxO alloying films were deposited on silicon substrates by a reactive magnetron sputtering method. The structures of the films were characterized by transmission electron microscopy(TEM) and X-ray diffraction(XRD) analysis, respectively. The XRD measurement shows that the wurtzite-type structure of (Zn1-xCdxO) can be stabilized up to Cd content of x=0.53 without a cubic CdO phase separation. The TEM measurement shows that the films have a columnar structure and the grains are highly c-axis oriented perpendicularly on silicon substrate although some grain boundaries are slightly tilted. High resolution TEM observation indicates that a native layer of amorphous SiO2 exists at the ZnCdO/Si interface and that ZnCdO grains with c-axis preferred orientation nucleate directly on substrate surface. Ternary Zn_(1-x)Cd_xO alloying films were deposited on silicon substrates by a reactive magnetron sputtering method. The structures of the films were characterized by transmission electron microscopy(TEM) and X-ray diffraction(XRD) analysis, respectively. The XRD measurement shows that the wurtzite-type structure of (Zn_(1-x)Cd_xO) can be stabilized up to Cd content of x=0.53 without a cubic CdO phase separation. The TEM measurement shows that the films have a columnar structure and the grains are highly c-axis oriented perpendicularly on silicon substrate although some grain boundaries are slightly tilted. High resolution TEM observation indicates that a native layer of amorphous SiO_2 exists at the ZnCdO/Si interface and that ZnCdO grains with c-axis preferred orientation nucleate directly on substrate surface.
出处 《中国有色金属学会会刊:英文版》 CSCD 2005年第1期135-138,共4页 Transactions of Nonferrous Metals Society of China
基金 Project(G2000068306) supported by the National Basic Research Program of China Project(00085) supported by Testand Analysis Foundation of Zhejiang Province
关键词 钆氧化锌合金 微观结构 反应溅射法 硅基薄膜 半导体 ZnCdO microstructure sputtering
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