射频磁控溅射制备TiO_(2-x)N_x薄膜及其光催化特性研究

Photocatalytic property of TiO_(2-x)N_x thin films prepared by r.f. magnetron sputtering

利用射频磁控溅射在玻璃衬底上制备了透明TiO2 和 TiO2-x Nx 薄膜样品,通过 X 射线衍射(XRD)、原子力显微镜(AFM)及 UV Vis分光光度计等测试手段表征了样品的结构、形貌和光催化性能。结果表明制备的薄膜为锐钛矿相结构。随着 N2/Ar气流比的增大薄膜样品出现新的物相,吸收光谱向可见光方向展宽,在N2/Ar流量比为 3∶100 时,制备的薄膜在可见光区具有很好的光催化性能。

Transparent TiO2 and TiO2-xNx thin films were prepared on glass substrates by r. f. magnetron sputtering. The crystalline structure, surface morphology, photocatalysis of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis spectrophotometer. The results showed that most TiO2-xNx thin films were anatase phase. A new crystalline phase was found in the nitrogen-rich film. The absorption edge of thin films were shifted to the lower-energy region with increasing of N2 /Ar gas flow ratio. The nitrogen-doped TiO2 thin film prepared with 3:100 sccm N2/Ar shows better photocatalytic activity at visible light region.