摘要
介绍了在激光薄膜中End Hall型离子源离子束清洗的应用。通过实验验证了基片的二次污染和离子束的清洗效果,观测了离子束清洗前后基片的表面形貌变化。研究了用离子束清洗基片时对薄膜抗激光损伤阈值的作用。分析了用离子束清洗基片时其基片表面的性质,如清洁度、表面能、接触角、表面形貌的变化机理。指出了杂质微粒的去除和附着力的增加是如何使薄膜抗激光损伤阈值显著提高的。
Using End-Hall ion source, the application of ion beam cleaning on the laser films is investigated. The re-contaminated phenomenon and ion cleaning effect are proved by experiments, and the modification of the substrate surface topography is observed. The effect of ion beam cleaning on the laser films is investigated. The mechanics of substrate surface characteristics modification, for example cleanness, surface energy, contact angle, and surface topography are analysed. It is concluded that the removal of impurity and the enhanced adhesion are contributed to the increase of laser-induced damage thresholds of films.
出处
《光学技术》
CAS
CSCD
北大核心
2005年第2期238-240,共3页
Optical Technique
关键词
激光薄膜
离子柬清洗
离子源
损伤阈值
laser films
ion beam cleaning
ion source
laser-induced damage thresholds
