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锑在直流反应磁控溅射制备二氧化钛薄膜中的作用 被引量:3

Influence of Sb Dopant in TiO_2 Film Growth by DC Reactive Magnetron Sputtering
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摘要 用直流反应磁控溅射方法在玻璃基底上制备了Sb修饰TiO2 薄膜 ,利用XRD ,Raman光谱以及SIMS研究了Sb对其表面结晶情况的影响并用XPS及SIMS分析了薄膜的成分。结果表明一定程度Sb的修饰对TiO2 薄膜成晶有优化作用 ,起到了类似表面活性剂的作用 ,并使薄膜表面的光致亲水性能得到改善。当Sb修饰过量时 ,破坏了TiO2 原有的晶格结构 ,劣化了薄膜表面的光致亲水性。 Sb-doped TiO2 films, grown on glass substrates by DC reactive magnetron sputtering, were characterized with X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and secondary ion mass spectroscopy (SIMS) to evaluate influence of Sb on film surface modification. The results show that an appropriate amount of Sb dopant, acting as a surfactant, may significantly improve its surface crystallization and its photo-induced surface hydrophilicity. However, too high a Sb concentration may inversely affect TiO2 crystal structure and the photo-induced surface hydrophilicity.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2005年第1期50-52,共3页 Chinese Journal of Vacuum Science and Technology
关键词 直流反应磁控溅射 TIO2薄膜 类似 二氧化钛薄膜 RAMAN光谱 表面 SIMS XRD XPS 劣化 Antimony Chemical modification Doping (additives) Hydrophilicity Magnetron sputtering Raman spectroscopy Secondary ion mass spectrometry Semiconducting films Surface active agents Titanium dioxide X ray diffraction analysis X ray photoelectron spectroscopy
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参考文献19

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