LIVCD法制备纳米氮化硅粉末工艺参数对粉体特征影响的研究

Study on the Technics Parameter's Influence to the Character of Nano Si_3N_4 Powder Fabricated by LIVCD

激光诱导气相沉积法是制备纳米氮化硅粉末的主要方法之一。在制备纳米粉体过程中,各工艺参数的变化对粉体特征有很大的影响。在激光制Si3N4纳米粉中基本的运行参数有:激光强度(I),反应池压力(P),反应火焰温度(T),反应气体配比(ΦSiH4／ΦNH3),反应气体流速(V)等。通过实验研究了各个工艺参数对粉体特征的影响并分析了其影响的原因。

Laser induced chemical vapor deposition is the main method among the methods of fabricating nano Si3N4. The changes of technics parameters have great influence to the character of nano powder. The powder density of CO2 laser, reaction cell perssure, reaction temperature, reactant gas ratio of ΦsiH4/ΦNH3, flow rate of reactant are the main parameters in the process of fabricating nano powder by LICVD. The influence to the character of nano Si3N4 powder by every technics parameter was studied and the influencing reason was analyzed.