期刊文献+

MOEMS阵列光开关的微反射镜的制作 被引量:2

Fabrication of reflective micromirror for MOEMS array optical switches
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摘要 通过各向异性湿法腐蚀工艺利用(110)硅片制作了8×8阵列光开关的微反射镜阵列,反射镜面为{111}面,表面粗糙度低于10nm, 垂直度好于用同样的方法在(100)硅片上制作的反射镜.
出处 《高技术通讯》 CAS CSCD 北大核心 2005年第3期53-55,共3页 Chinese High Technology Letters
基金 国家高技术研究发展计划(863计划),教育部跨世纪优秀人才培养计划,吉林大学校科研和教改项目
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参考文献6

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二级参考文献10

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同被引文献12

  • 1HOFFMANN M, VOGES E. Bulk silicon micromachining for MEMS in optical communication system[J]. J Micromech Microeng, 2002(12):349- 360.
  • 2HECTH J. All-optical networks need optical switches[J]. Laser Focus World, 2000(5): 189 -- 192.
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  • 4LI J, ZHANG Q X, LIU A Q. Advanced fiber optical switches using deep RIE(DRIE) fabrication[J]. Sensor and Actuator A ,2003,102:286 --295.
  • 5WU W G, HAO Y L, LID C, et al. Fabrication and electromechanical characteristics of 2×2 torsionmirror optical switch arrays with monolithically integrated fiber self-holding structures[J].Chinese J of Semiconductors,2002,23(10):1024-- 1030.
  • 6Volland B E,Heerlein H,Kostic I,et al.The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS[J].Microelectronic Engineering,2001,(57-58):641-650.
  • 7Li J,Liu A Q,Z,hang Q X.Tolerance analysis for comb-drive actuator using DRIE fabrication[J].Sensors and Actuators A,2006,125:494-503.
  • 8Li J,Zhang Q X,Liu A Q.Advanced fiber optical switches using deep RIE(DRIE)fabrication[J].Sensors and Actuators A,2003,102:286-295.
  • 9Biswas K,Das S,Maurya D K,et al.Bulk micromachining of silicon in TMAH-based etchants for aluminum passivation and smooth surface[J].Microelectronics Journal,2006,37:321-327.
  • 10Pennelli G,Piotto M,Barillaro G.Silicon singleelectron transistor fabricated by anisotropie etch and oxidation[J].Microetectronic Engineering,2006,83:1 710-1 713.

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