纯氮气氛活性屏离子渗氮的研究

Study of Active Screen Plasma Nitriding in Pure Nitrogen

在纯氮气氛中,利用活性屏离子渗氮(ASPN)技术对 38CrMoAl钢进行了离子渗氮处理,并对渗层的组织结构、硬度、深度等进行了分析。结果表明,只有直流辉光放电电压高于 800V时,在纯氮气氛中才能进行活性屏离子渗氮处理。通过对等离子放电空间的粒子进行XRD分析发现,放电电压低于 800V时,沉积在基材表面的粒子主要是氧化铁(Fe3O4 );放电电压高于 800V时,沉积在基材表面的粒子才是能进行活性屏离子渗氮处理的铁的氮化物(ε、γ′)。

38CrMoAl steel was nitrided under the pure nitrogen by active screen plasma nitriding (ASPN). The micro-structure, microhardness and the nitriding layer depth were analyzed. The results show that ASPN could be carried out in pure nitrogen only when the DC glow discharge voltage is higher than 800 V. By analyzing XRD patterns of the particles in plasma space can find that the particles deposited in the surface of the substrate are mostly iron oxide when the voltage is lower than 800 V, instead of iron nitride that could be used for ASPN when the voltage is beyond 800 V.