XH－REP－2正性电子束抗蚀剂的工艺研究

STUDY OF OPTIMAL PROCESSING FORXH-REP-2 POSITIVE ELECTRON-BEA MRESISTS

ＸＨ－ＲＥＰ－２正性电子束抗蚀剂的工艺研究王国荃，罗腾蛟，王琴美，吴月莉（中国科学院上海冶金研究所）关键词：电子束曝光，等离子体去渣．０引言普通光学的曝光分辨率受到光波衍射效应的限制，难以制作１μｍ以下的图形；当ＰＧ图形分割的矩形数超过２０万，普通光...

This paper describes briefly the principle and characteristics of electron-beamlithography.The mechanism of the interaction of energetic electrons with resistmaterials is also described.The whole processing of XH-REP-2 positive electron-bcam resists discussed in detail. We have found a group of optimal parametersof XH-REP-2 positive electron-beam resists and come to the conclusion thatXH-REP-2 positive electron-beam resists have high resolution and sensitivity.