摘要
采用钛-铝-钼过渡层研究了铜基片上金刚石薄膜的化学气相沉积。用SEM和Raman谱研究了薄膜的形貌和质量。用XRD分析了膜基间形成的化合物的成分,并进一步分析了铝的存在对膜基结合力的影响。实验证明,钛-铝-钼过渡层的存在显著提高了金刚石薄膜与铜基底的结合力。
The chemical vapor deposition of dia mond films on copper substrates with Ti -Al -Mo intermediate layer was studied.Scanning electron microsc opy and Raman spectroscopy were used to analyze the films.The component o f composites formed in the interface of the films a nd substrate was examined by XRD.The effect on the adhesion due to the exis tence of Al film was further studied.It showed t hat the adhesion of the diamond films on the copper substrate could be greatly improved.
出处
《真空与低温》
2005年第1期46-49,共4页
Vacuum and Cryogenics
