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LC19离子注入机控制方法及主控制器原理分析 被引量:3

Control Method of LC19 Ion Implanter and Master Controller's Principle Analysis
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摘要 为了使离子注入机满足生产线工艺的要求,控制系统的设计必须使控制功能完善、控制命令响应迅速、命令执行准确可靠、异常处理迅速有效和整机工作稳定可靠。LC19离子注入机控制系统采用主从集中式控制方法,较好地解决了控制功能复杂与控制系统反应迅速、高效、稳定、可靠之间的矛盾。其主控制器的设计采用双端口存储器传递主控制计算机的命令,实现对各子控制系统的控制,其原理简单,但很好地解决了主从式集中控制方法中信息高速传递的难题。计算机与主控制器间采用8位总线送数,主控制器与子控制器之间采用高速串口送数。主控制计算机可向双端口存储器的A,B两区交替发送命令。而且,主从控制器之间采用了巧妙的通讯监控方法,一旦发生通讯故障,子控制器就会清"0"复位,避免机器失控。介绍了主从式集中控制的硬件及其特点,分析了主控制器的设计原理,说明了其软件流程,简述了其调试结果。 In order to make ion implanter to satisfy the requirements of the semiconductor production processes, the control system of an implanter must be designed so that its control functions are strong. The instructions from the control computer can be executed rapidly and accurately. When the implanter goes wrong, the control computer can find it promptly and take action to do abnormity interrupt service effectively. LC19 ion implanter makes use of a single centralized-control computer to control the subsystems. By this method, a complicated control system has been designed to obtain the effective, stable and reliable control of the implanter. The master controller has been designed to receive instructions from the centralized-control computer by way of double port SRAM connected to ISA bus. The computer can send out instructions to A location and B location of the double port SRAM alternately. Then, the master controller tells subcontrollers what they should do by serial port at high speed. The principle is simple, but instructions can be transmitted and executed promptly. Between the master controller and subcontrollers, the communication can be checked making use of a clever method. As soon as the communication breaks off, sub-controllers will reset themselves promptly preventing the implanter from running away. This paper describes the control method and its characteristics at first, then explains the principle and program flow chart of the master controller.
出处 《微细加工技术》 EI 2005年第1期12-16,共5页 Microfabrication Technology
关键词 大角度离子注入机 控制器 异常处理 软件流程 big angle implanter controller abnormity interrupt service program flow chart
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参考文献3

  • 1Renau Anthony, Hacker David. The ⅦSta 810300mm Medium Current Ion Implanter [A].1998 International Conference on Ion Implantation Technology Proceedings[ C]. Kyoto(Japan):The Institute of Electrical and Electronics Engineers, Inc(IEEE), 1998.
  • 2Meulen Pvan der, Ammon F. The ES00- A New Medium Current-High Energy Implanter [A].1992 International Conference on Ion Implantation Technology Proceeding [C]. Gainsville: The Institute of Electrical and Electronics Engineers,Inc(IEEE), 1993.
  • 3Oison J C, Renau A, Buff J. Scanned Beam Uniformity Control in the ⅥSSta 810 Ion Implanter [A]. International Conference on Ion Implantation Technology Proceedings[C]. Kyoto(Japan):The Institute of Electrical and Electronics Engineers, Inc(IEEE), 1998.

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