电光调制技术在光刻对准中的应用

Application of Electro-optical Modulation Technique in Lithography Alignment

介绍了投影光刻机离轴对准系统的结构和相位探测的原理,详细讨论了电光相位调制技术抑制杂散光的机理,并分析比较了有无杂散光对光刻对准精度的影响。结果表明,使用电光调制技术可有效提高投影光刻的对准精度。

The construction and phase detection theory of off-axis alignment system in projection photolithography are introduced in detail. The method of restraining the stray light using electro-optical phase modulator is proposed extensively. The alignment accuracies are analyzed and compared when the stray light exists or not. Results show that the alignment accuracy is obviously improved by the electro-optical modulation. Thus, electro-optical modulation is one of the effective technologies to improve the alignment accuracy in projection photolithography.