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单片集成电路中镍-铬电阻的制作

Fabrication of Nickle-Chrome Resistors in a Monolithic Integrated Circuit
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摘要 本文介绍单片集成电路中采用高精度、高可靠性和低温度系数镍-铬金属薄膜电阻代替扩散电阻的情况,详细论述镍-铬电阻的制作工艺、操作过程及工艺中的注意事项。实验表明,严格控制工艺条件是保证制取优值镍-铬电阻的关键。 A nickle-chrome film resistor with high accuracy, high reliability and low temperature coefficient has been used as a diffus on resitor. The application of the resistor to a monolithic 1C is presented in this article. Fabrication processes, operating procedures for the nickle-chrome resistor and other important things in the process are described m detail. Experiments show that strickt control over processing -conditions is very critical to the fabrication of excellent nickle-chiome resistors.
作者 孙德珍
出处 《微电子学》 CAS CSCD 1989年第2期7-10,共4页 Microelectronics
关键词 单片 集成电路 镍-铬 电阻 Monolithic IC, Metal resistor, Radiation-tolerant
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