摘要
采用扫描电镜(SEM)和扫描俄歇微探针(SAM)对国内研制开发的微波GaAs功率FET芯片在射频测试中的烧毁进行了分析研究。探讨其烧毁机理及物理过程。
Microwave GaAs power FET chips fabricated by us which appear burnout during the RF testing are investigated by means of scanning electron microscopy(SEM)and Auger microprobe(SAM).The physics procedure and mechanism of RF burnout are analyzed。
出处
《真空与低温》
1994年第4期187-190,共4页
Vacuum and Cryogenics
关键词
微波
砷化镓
功率场效应
晶体管
射频烧毁
Microwave GaAs power FET(field effect'transistor),RF burnout,thermal and electrical transient state,thermal runaway.matching feature。