期刊文献+

Lattice-Matched InP-Based HEMTs with T^T of 120GHz 被引量:2

截止频率为120GHz的晶格匹配InP基HEMT(英文)
下载PDF
导出
摘要 Lattice matched InP based InAlAs/InGaAs HEMTs with 120GHz cutoff frequency are reported.These devices demonstrate excellent DC characteristics:the extrinsic transconductance of 600mS/mm,the threshold voltage of -1 2V,and the maximum current density of 500mA/mm. 报道了具有良好直流特性的晶格匹配 InP基 HEMT,器件的跨导为 600mS/mm,阈值电压为-1 2V,最大电流密度为500mA/mm,截止频率为120GHz.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第3期472-475,共4页 半导体学报(英文版)
基金 国家自然科学基金(批准号:60276021) 国家重点基础研究发展规划(批准号:G2002CB311901)资助项目~~
关键词 cutoff frequency high electron mobility transistors INALAS/INGAAS INP 截止频率 高电子迁移率场效应晶体管 InAlAs/InGaAs InP
  • 相关文献

参考文献8

  • 1Streit D,Lai R,Oki A,et al.InP HEMT and HBT technology and applications.Electron Devices for Microwave and Optoelectronic Applications,2002:14.
  • 2Chen Y W,Hsu W C,Hsu R T,et al.Characteristics of InAAs/InGaAs HEMTs with various InGaAs channels.SolidState Electron,2004,48(1):119.
  • 3Suemitsu T,Ishii T,Yokoyama H,et al.30-nm InAlAs/InGaAs HEMTs lattice-matched to InP substrate.IEDM,San Francisco,California,1998:223.
  • 4Endoh A,Yamashita Y,Higashiwaki M,et al.High fT 50-n m-gate lattice-matched InAlAs/InGaAs HEMTs.International Conference on Indium Phosphide and Related Materials,williamsburg,VA,USA,2000:87.
  • 5Yamashita Y,Endoh A,Shinohara K,et al.Ultra-short 25-nm-gate lattice-matched InAlAs/InGaAs HEMTs within the range of 400GHz cutoff frequency.IEEE Electron Device Lett,2001,22(8):367.
  • 6Suemitsu T,Yokoyama H,Ishii T,et al.30-nm two-step recess gate InP-based InAlAs/InGaAs HEMTs.IEEE Trans Electron Devices,2002,49(10):169.
  • 7Yamashita Y,Endoh A,Shinohara K,et al.Pseudomorphic InAlAs/InGaAs HEMTs with an ultrahigh fT of 562GHz.IEEE Electron Device Lett,2002,23(10):573.
  • 8石华芬,张海英,刘训春,陈宝钦,刘明,王云翔.一种新的高成品率InP基T型纳米栅制作方法[J].Journal of Semiconductors,2003,24(4):411-415. 被引量:7

二级参考文献7

  • 1Smith P M,Nichols K,Kong W,et al.Advances in InPHEMT technology for high frequency applications.2001 IEEE GaAs Digest,2001:7
  • 2Nguyen L D,Brown A S,Thompson M A,et al.50nm self-aligned-gate pseudomorphic AlInAs/GaInAs high electron mobility transistors.IEEE Trans Electron Devices,1992,39(9):2007
  • 3Shinohara K,Yamashita Y,Hikosaka K,et al.Ultra-short T-shaped gate fabrication technique for InP based HEMTs with high ft(>300GHz) and their MMIC applications.23rd GaAs IC Symposium Digest,2001:252
  • 4Todokoro Y.Double-layer resist films for submicrometerelectron-beam lithography.IEEE Trans Electron Devices,1980,27(8):1443
  • 5Chao P C,Smith P M,Palmateer S C,et al.Electron-beam fabrication of GaAs low-noise MESFET's using a new trilayer resist technique.IEEE Trans Electron Devices,1985,ED-32(6):1042
  • 6Wakita A S,Su C Y,Rohdin H,et al.Novel high-yeild trilayer resist process for 0.1μm T-gate fabrication.J Vac Sci Technol B,1995,13(6):2725
  • 7郑英奎,刘明,和致经,吴德馨.0.1μmT型栅PHEMT器件[J].Journal of Semiconductors,2001,22(4):476-480. 被引量:5

共引文献6

同被引文献20

  • 1康耀辉,林罡,李拂晓.InAlAs/InGaAs/InP HEMT欧姆接触研究[J].固体电子学研究与进展,2008,28(1):145-148. 被引量:6
  • 2张胜利,孙建伟,刘宇,祝宁华.光探测器芯片的高频特性测量[J].中国激光,2004,31(7):857-860. 被引量:7
  • 3Dichmann Jurgen, Berg Michael, Ziegler Volker, et al. MM-wave HEMT based circuits and their system applications [J]. Solid-State Electronics, 1999, 43: 1607-1612.
  • 4Schlechtweg Michael, Tessmann Axel. From 100 GHz to terahertz electronics-activities in europe[J]. IEEE, 2006:8-11.
  • 5Elgaid K, Mcleltand H, Holland M. 50 nm T-gate metamorphic GaAs HEMTs with Ft of 440 GHz and noise figure of 0.7 dB at 26 GHz[J]. IEEE Electron Device Letters, 2005,26 (11 ):784-786.
  • 6Brech H, Grave T, Simlinger T, et al. Influence of T-gate shape and footprint length on PHEMT high frequency performance[J]. IEEE,1997: 66-69.
  • 7Miras Agnes, Legros Eric. Very high-frequency small-signal equivalent circuit for short gate-length InP HEMT's [J]. IEEE Transactions on Microwave Theory and Techniques, 1997, 45(7) : 1018-1026.
  • 8A.Tessmann,A.Leuther,V.Hurmet al.Metamorphic HEMT MMICs and modules operating between 300and500GHz[].IEEE Journal of Solid State Circuits.2011
  • 9A.Endoh,K.Shinohara,I.Watanabe et al.Low-voltage and high-speed operations of 30-nm-gate pseudomorphic In0.52Al0.48As/In0.7Ga0.3As HEMTs under cryogenic conditions[].IEEE Electron Device Letters.2009
  • 10R.Lai,X.B.Mei,S.Sarkozyet al.Sub 50nm InP HEMT with fT=586GHz and amplifier circuit gain at 390GHz forsub-millimeter wave applications[].ProcIEEE nd IntConfIPRM.2010

引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部